Reuter, Christoph; Strehle, Steffen Sub-10 nm oxidation and etching of graphite using field emission
scanning Probe lithography CARBON, 245 , 2025, DOI: 10.1016/j.carbon.2025.120779. Abstract | BibTeX | Endnote @article{WOS:001568907800004,
title = {Sub-10 nm oxidation and etching of graphite using field emission
scanning Probe lithography},
author = {Christoph Reuter and Steffen Strehle},
doi = {10.1016/j.carbon.2025.120779},
times_cited = {2},
issn = {0008-6223},
year = {2025},
date = {2025-10-01},
journal = {CARBON},
volume = {245},
publisher = {PERGAMON-ELSEVIER SCIENCE LTD},
address = {THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND},
abstract = {We employ an atomic force microscope operated under ambient conditions
for a resist-free patterning of HOPG and exfoliated graphite nanosheets.
The nano-structuring is realized through an electrochemical surface
oxidation induced by low-energy electrons field emitted from the tip of
an AFM cantilever in close proximity to the sample surface. Unlike
previous approaches, we positioned the cantilever tip several tens of
nanometers above the surface-adsorbed water layer, rather than within
it, making the beam diameter of the field emitted electrons the limiting
factor for the achievable patterning resolution. This approach enabled
the growth of non-volatile oxide species as well as a direct etching of
material with resolutions well below 10 nm under ambient conditions. The
tip-written structures were subsequently analysed using Raman
spectroscopy and conductive AFM measurement.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
We employ an atomic force microscope operated under ambient conditions
for a resist-free patterning of HOPG and exfoliated graphite nanosheets.
The nano-structuring is realized through an electrochemical surface
oxidation induced by low-energy electrons field emitted from the tip of
an AFM cantilever in close proximity to the sample surface. Unlike
previous approaches, we positioned the cantilever tip several tens of
nanometers above the surface-adsorbed water layer, rather than within
it, making the beam diameter of the field emitted electrons the limiting
factor for the achievable patterning resolution. This approach enabled
the growth of non-volatile oxide species as well as a direct etching of
material with resolutions well below 10 nm under ambient conditions. The
tip-written structures were subsequently analysed using Raman
spectroscopy and conductive AFM measurement. - FNClarivate Analytics Web of Science
- VR1.0
- PTJ
- AFChristoph Reuter
Steffen Strehle
- TISub-10 nm oxidation and etching of graphite using field emission
scanning Probe lithography - SOCARBON
- DTArticle
- ABWe employ an atomic force microscope operated under ambient conditions
for a resist-free patterning of HOPG and exfoliated graphite nanosheets.
The nano-structuring is realized through an electrochemical surface
oxidation induced by low-energy electrons field emitted from the tip of
an AFM cantilever in close proximity to the sample surface. Unlike
previous approaches, we positioned the cantilever tip several tens of
nanometers above the surface-adsorbed water layer, rather than within
it, making the beam diameter of the field emitted electrons the limiting
factor for the achievable patterning resolution. This approach enabled
the growth of non-volatile oxide species as well as a direct etching of
material with resolutions well below 10 nm under ambient conditions. The
tip-written structures were subsequently analysed using Raman
spectroscopy and conductive AFM measurement. - Z92
- PUPERGAMON-ELSEVIER SCIENCE LTD
- PATHE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND
- SN0008-6223
- VL245
- DI10.1016/j.carbon.2025.120779
- UTWOS:001568907800004
- ER
- EF
|
