The furnace room is a dedicated facility to support high temperature equipment such as plasma enhanced chemical vapor depositors (PE-CVD), thermal evaporators, muffle furnaces and convection ovens. Applications range from growing graphene, boron nitride (BN), transition metal dichalcogenides (TMD) to sample annealing, baking and pyrolysis. Each growth chamber is equipped with dedicated programmable mass flow controllers (MFC’s) and pumping system for process specific gas and pressure requirement. In the preliminary stage, the furnace facility will heavily produce candidate materials to be investigated as potential Functional Intelligent Materials (FIM’s). Whereas in the long term, as part of the proposed Materials Robotics Lab (MRL), it will house high throughput growth chambers which are expected to churn out materials with predesigned structures and functionalities, aided by Machine Learning (ML) capabilities.

List No.	Key Specifications	Picture
A	Horizontal furnaces   Two-Zone Split Tube Furnace Max. temperature 1200°C  Heating zone length: 450 mm   With active cooling and turbomolecular pump
	Single-Zone Tube Furnace Max. temperature 1600°C  Heating zone length: 450 mm  With active cooling and turbomolecular pump
B	Customized PE-CVD   Three-zone split tube furnace  Max. temperature 1200°C  Heating zone length: 610 mm  With active cooling and turbomolecular pump  500W plasma generator with dedicated 2” quartz tube for PE-CVD
C	Vacuum drying oven  Volume: 25L  Max. temperature 250°C   Ultimate Pressure: <0.01 mbar
	Muffle furnace No 1 Volume: 22L  Max. temperature 1100°C
	Muffle furnace No 2 Volume: 20L  Max. temperature 800°C
	Convection oven  Volume: 120L  Max. temperature 300°C
D.	Vacuum Deaeration Mixer equipped with a special container and has the maximum capacity of mixing and defoaming of 350ml/350g can mix the materials at high speed revolution (up to 2500rpm) under vacuum condition, and achieve efficient defrosting effect noncontact mixing mode.